Hi,
I have an illumination design layout in sequential mode below. And I am observing the illumination pattern using geometric image analysis. The question is how to control, optimize the illumination pattern parameters like the size, uniformity efficiency etc. in merit function in seq mode? Is there a method to optimize for geometric image analysis result.
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Hi Fehim,
Zemax has a support article on the design of a top-hat beam shaper. It builds the merit function through the macro language (ZPL). It addresses the size of the illumination, and perfect uniformity is the target.
You might look at Kats Ikeda’s presentation too on truefreeform.
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