Hello everyone

I want to simulate darkfield imaging in zemax nsq mode.
In the attached file, I have implemented the reflective target (made by Part designer in Zemax, + shaped) that I want to image, and the coaxial illumination and side illumination.
The target is made of two different types of metals that are very thin, and I have actually confirmed that it appears as a darkfield in a microscope or other illumination optical system.
(The attached file is a simply configured 4f imaging system.)

I want to check whether darkfield illumination is implemented by simply setting the illumination and scattering characteristics of the target in this optical system, so that only the edge of the target is visible as a line.

I want to check whether darkfield imaging is implemented by making the side illumination angle closer to the target than in the attached file, and whether any scattering model is used.
What parameters should I adjust?

Thank you.

Best Regard