Dear Zemax community,I have been trying to design a bottom lens for a projector with a BFL of 90mm, Clear Aperture = 115 mm. We started with initial Edmund optics concentrator Sequential design except that we had to keep the second surface with Fresnel coefficients shown below. We then copied those optimized base radius and coefficients in NSC Editor and gave the desired groove frequency of -2, pitch = 10. But in mixed mode, the surface is not able to focus the marginal rays until we set the object position in the reverse direction. Is it the right approach, if yes then:why doesn’t it show correct EFFL in mixed simulation? Why is the convergence not shown in shaded model? How to use rms optimization in mixed mode?And in case it isn’t the right approach, I would like to know the right direction.
What a course by Zemax, LLC and Edmund Optics that will teach you how to:* Define the basic properties of light and how it interacts with other objects* Interpret simple ray diagrams*Define optical system requirements and describe how they affect system performance*Identify factors limiting optical performance*State the optical aberrations and their effects on real systems*List sources of error in manufacturing and assembly and describe how they can affect system performanceCertificationLinkedin post!
HI community!Actually i was going through the THOR Lab manual for FTIR spectroscopy and got stuck at understanding the relationship between resolution expressed in wavenumbers (R cm^1-) and in nanometer (R(nm). In the Table-2 (link given below) of that manual, can someone explains the conversion formulae used for calculation ? FTIR document reference
Dear all!Greetings of the day! Hope this mail finds you well. Open for the Optical Design Engineer opportunity. To catch your attention I would like to brief in very simple words about my expertise. With a strong background in Microelectronics and VLSI at post graduate level where I completed my project on designing a dynamic latch comparator from RTL to GDS flow using Synopsys Galaxy custom designer 32 nm PDK. Followed by my doctoral (pursuing since 2018) in computational modeling of Nanophotonic Image sensors with a good record of certifications in using industry standard simulation tools (ANSYS Lumerical, HFSS) and Zemax (Optistudio). Above all, my love for learning new IC technology encouraged me to complete the risc-v-myth-workshop by VSD-Design and RedWoodEDA, where I was recognized by the trainers as top performers. I have also supervised two VLSI Post graduates back in 2016-17 session.Some of my top certifications are listed below: CUSTOM LAYOUT -VSD DESIGN - UDEMYMUTx: PHOTO
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