Hi, i’m new to Zemax and i’m finding some problem for my application. I have four rectangular volumes: a layer of aor, a layer of f.silica and a layer of silicon and another layer of air one over the other.I generate photons with a specific wavelength in the fused silica layer with a given angle towords the silicon layer. I want to study the absorption of photons in silicon and the fraction of reflected photons.However when i trace a given ray, it is propagated in all the system and i don’t see any absorption. (It just moves between the f. silica and silicon layer back and forth). The question is : is the photoelectric absorption taken into account automatically be zemax or not? And why do I see infinite reflections? Another important thing is that silicon is not modeled in my range of interest (400-700 nm) (INFRARED catalogue) and i copied the catalogue in order to extend the refractive index parametrization to my range of interest. Is there another way to do this? And could this infl
I’m trying to convert a CodeV seq file into OpticStudio. Everything converted successfully except for the diffractive surface. ZOS made the surface a Binary 2, but no coefficients were translated. I’ve tried to find a reference for how CodeV defines their diffractive surface, but was unsuccessful in my search. In the snip from the seq file below, I need to figure out what A and B coefficients are and also what the HCO C1 and C2 are. S 162.967 46.58723622430936 AIR THC 0 SLB "L12.2" CIR 28.5 CIR EDG 31.0 ADX EDG 0.0 ASP K -1.826 CUF 0.0 A 0.6605800000000001e-7; B -0.23953e-12; C 0.0; D 0.0 DIF HOE HV1 REA; HV2 REA HOR 1.0; HTH 0.0; HIN 0.0; HDI 0.0 HSW 0.0; HDN 0.0 HX1 0.0; HY1 0.0; HZ1 0.0 HX2 0.0; HY2 0.0; HZ2 0.0 HWL 4250.0; HCT R HCO C1 -0.3795800000000001e-4; HCC C1 100; HCO C2 0.20705e-8; HCC C2 100Thanks in advance for any help you can provide.
How to evaluate the a manufacturing difficulty of surface kinoform (binary 2)?
Hello Zemax Support Team, I’m trying to model a volume hologram in a film inside a glass substrate. In particular, I’d like to be able to calculate the diffraction efficiency of the structure. However, the system seems to have an unreasonable polarization dependence which causes energy to not be conserved for some polarization states such that {input_power ≠ diffracted_power (1st order) + transmitted_power (0-order)}. I am using the volume hologram feature (set to 1) in the Hologram Lens object in non-sequential mode. Collimated input laser beam is normal to the glass and the outcoupled beam totally internally reflects inside the glass substrate upon diffraction. I have 2 monitors: 1) color detector capturing the 0-order transmission and, 2) color detector capturing the 1st diffraction order. X-linearly polarized light and Y-linearly polarized light produce different diffraction efficiencies, as expected. However, for linear X polarization the sum of the 1st-order diffraction and 0-ord
Boundary operands should be use to constrain some parameters, such as the center thickness of the surface, to be greater or less than the specified target value. However, this boundaries can be violated if this results in a better overall performace (lower merit function). Therefore, if this boundary shouldn’t be violated, then the weight on the boundary constraint operand must be increased (>1), which will increase the “importance” of this operand, so that violating it will always make the merit function worse. More information about operand weights can be found browsing the help files such as: The Optimize Tab (sequential ui mode) > Optimization Overview > Notes on Operand Weights
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